Dr. Nick A. Stacey
Global Laboratory Manager at 3M Co
SPIE Involvement:
Publications (8)

Proceedings Article | 19 May 2008 Paper
Proceedings Volume 7028, 70280R (2008) https://doi.org/10.1117/12.793034
KEYWORDS: Semiconducting wafers, Line width roughness, Lithography, Etching, Photomasks, Critical dimension metrology, Beam shaping, Overlay metrology, Manufacturing, Line edge roughness

Proceedings Article | 23 January 2006 Paper
Niyaz Khusnatdinov, Gary Doyle, Mike Miller, Nick Stacey, Mike Watts, Dwayne LaBrake
Proceedings Volume 6110, 61100K (2006) https://doi.org/10.1117/12.647301
KEYWORDS: Lenses, Etching, Lithography, Polarizers, Aluminum, Optical lithography, Optical components, Fabrication, Photoresist processing, Semiconducting wafers

Proceedings Article | 6 May 2005 Paper
Mike Miller, Gary Doyle, Nick Stacey, Frank Xu, S. Sreenivasan, Mike Watts, Dwayne LaBrake
Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.607340
KEYWORDS: Semiconducting wafers, Etching, Lithography, Polishing, Nanoimprint lithography, Silicon, Photomicroscopy, Optical lithography, Scanning electron microscopy, Nanolithography

Proceedings Article | 20 May 2004 Paper
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.536216
KEYWORDS: Etching, Polymerization, Molecules, Monte Carlo methods, Finite element methods, Lithography, Ultraviolet radiation, Molecular interactions, Scanning electron microscopy, Optical lithography

Proceedings Article | 20 May 2004 Paper
Frank Xu, Nicholas Stacey, Mike Watts, Van Truskett, Ian McMackin, Jin Choi, Philip Schumaker, Ecron Thompson, Daniel Babbs, S. Sreenivasan, C. Grant Willson, Norman Schumaker
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.538734
KEYWORDS: Lithography, Ultraviolet radiation, Silicon, Optical lithography, Liquids, Semiconducting wafers, Etching, Optical alignment, Scanning electron microscopy, Interfaces

Showing 5 of 8 publications
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