Dr. Nickolay Stepanenko
Assignee at IMEC at IMEC
SPIE Involvement:
Author
Publications (15)

PROCEEDINGS ARTICLE | May 11, 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Reticles, Inspection, Distortion, Atomic force microscopy, Scanning electron microscopy, Printing, Wafer inspection, Photomasks, Extreme ultraviolet, Semiconducting wafers

PROCEEDINGS ARTICLE | April 1, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Oxides, Logic, Optical lithography, Etching, Scanners, Coating, Double patterning technology, Thin film coatings, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | May 11, 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Carbon, Point spread functions, Multilayers, Reticles, Contamination, Silicon, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | April 4, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Quartz, Polymers, Water, Crystals, Silicon, Inspection, Digital watermarking, Immersion lithography, Thin film coatings, Semiconducting wafers

SPIE Journal Paper | July 1, 2006
JM3 Vol. 5 Issue 03
KEYWORDS: Semiconducting wafers, Photoresist processing, Photomasks, Contamination, Lithography, Scanners, Line edge roughness, Binary data, Head, Critical dimension metrology

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Water, Scanners, Particles, Digital watermarking, Scatterometry, Photomasks, Immersion lithography, Critical dimension metrology, Thin film coatings, Semiconducting wafers

Showing 5 of 15 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top