Dr. Nickolay Stepanenko
Senior Manager at ASML Netherlands BV
SPIE Involvement:
Publications (16)

Proceedings Article | 11 May 2009 Paper
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Reticles, Inspection, Distortion, Atomic force microscopy, Scanning electron microscopy, Printing, Wafer inspection, Photomasks, Extreme ultraviolet, Semiconducting wafers

Proceedings Article | 1 April 2008 Paper
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Oxides, Logic, Optical lithography, Etching, Scanners, Coating, Double patterning technology, Thin film coatings, Photoresist processing, Semiconducting wafers

Proceedings Article | 11 May 2007 Paper
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Carbon, Point spread functions, Multilayers, Reticles, Contamination, Silicon, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

Proceedings Article | 4 April 2007 Paper
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Quartz, Polymers, Water, Crystals, Silicon, Inspection, Digital watermarking, Immersion lithography, Thin film coatings, Semiconducting wafers

Proceedings Article | 13 March 2007 Paper
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Lithography, Point spread functions, Reticles, Scanners, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Line edge roughness

Showing 5 of 16 publications
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