Dr. Nicolae Maxim
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | May 27, 2009
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Lithography, Reticles, Optical lithography, Contamination, Air contamination, Manufacturing, Pellicles, Humidity, Photomasks, Contamination control

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Carbon, Lithography, Sensors, Calibration, Polymers, Ultraviolet radiation, Silicon, Nitrogen, Photoresist materials, Semiconducting wafers

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