Dr. Nicolas Possémé
at CEA-LETI
SPIE Involvement:
Conference Program Committee | Author
Publications (9)

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Polymethylmethacrylate, Etching, Ultraviolet radiation, Silicon, Scanning electron microscopy, Surface properties, Line width roughness, Directed self assembly, Plasma, Nanowires

PROCEEDINGS ARTICLE | April 27, 2017
Proc. SPIE. 10144, Emerging Patterning Technologies
KEYWORDS: Lithography, Electron beam lithography, FT-IR spectroscopy, Ions, Silicon, Microelectronics, Ion implantation, Integrated circuits, Wet etching, Ion beam lithography

PROCEEDINGS ARTICLE | April 10, 2017
Proc. SPIE. 10149, Advanced Etch Technology for Nanopatterning VI
KEYWORDS: Lithography, Electron beam lithography, Etching, Line width roughness, Directed self assembly, Nanoimprint lithography, Critical dimension metrology, Photoresist processing, Semiconducting wafers, System on a chip

SPIE Journal Paper | August 25, 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Directed self assembly, Annealing, Polymethylmethacrylate, Line width roughness, Picosecond phenomena, Semiconducting wafers, Lithography, Optical lithography, Image registration, Plasma

PROCEEDINGS ARTICLE | March 23, 2016
Proc. SPIE. 9782, Advanced Etch Technology for Nanopatterning V
KEYWORDS: Polymethylmethacrylate, Etching, Chemistry, Xenon, Directed self assembly, Plasma etching, Picosecond phenomena, Semiconducting wafers, Carbon monoxide, Plasma

PROCEEDINGS ARTICLE | March 21, 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Lithography, Optical lithography, Statistical analysis, Polymethylmethacrylate, Polymers, Annealing, Image registration, Photomasks, Line width roughness, Directed self assembly, Line edge roughness, Semiconducting wafers, Polymer thin films, 193nm lithography

Showing 5 of 9 publications
Conference Committee Involvement (5)
Advanced Etch Technology for Nanopatterning VIII
25 February 2019 | San Jose, California, United States
Advanced Etch Technology for Nanopatterning VII
26 February 2018 | San Jose, California, United States
Advanced Etch Technology for Nanopatterning VI
27 February 2017 | San Jose, California, United States
Advanced Etch Technology for Nanopatterning V
22 February 2016 | San Jose, California, United States
Advanced Etch Technology for Nanopatterning IV
23 February 2015 | San Jose, California, United States
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