Dr. Nicolas I. Vaissiere
Research Associate at III-V Lab
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 17 March 2023 Presentation
Joan Manel Ramirez, Pierre Fanneau, Claire Besancon, Delphine Néel, Alexandre Shen, Amin Souleiman, Valentin Ramez, Nicolas Vaissiere, Stéphane Malhouitre, Karim Hassan, Jean Decobert, Kamel Merghem, David Bitauld
Proceedings Volume PC12424, PC124240B (2023) https://doi.org/10.1117/12.2648796
KEYWORDS: Optical communications, Laser optics, Waveguides, Wave propagation, Tunable lasers, Silicon photonics, Semiconductor optical amplifiers, Refractive index, Quantum wells, Molybdenum

Proceedings Article | 11 January 2023 Presentation + Paper
J. Ramirez, Amin Souleiman, Pierre Fanneau, Claire Besancon, Nicolas Vaissiere, Delphine Néel, Valentin Ramez, Stéphane Malhouitre, Karim Hassan, K. Merghem, Jean Decobert, David Bitauld
Proceedings Volume 12334, 1233409 (2023) https://doi.org/10.1117/12.2656126
KEYWORDS: Tunable lasers, Waveguides, Silicon, Optical gratings, Integrated optics, Wafer bonding, Emission wavelengths, Design and modelling, Semiconducting wafers, Tunable filters

Proceedings Article | 6 October 2021 Presentation + Paper
Delphine Néel, Alexandre Shen, Pierre Fanneau de La Horie, Nicolas Vaissière, Arnaud Wilk, Viviane Muffato, Stéphane Malhouitre, Valentin Ramez, Yohan Desières, Karim Hassan
Proceedings Volume 11880, 118800M (2021) https://doi.org/10.1117/12.2603190
KEYWORDS: Silicon, Semiconducting wafers, Waveguides, Photodiodes, Photonic integrated circuits, Tunable lasers, Modulators, Silica, Quantum wells, Transceivers

Proceedings Article | 6 October 2021 Presentation + Paper
C. Besancon, D. Néel, G. Cerulo, D. Make, N. Vaissiere, F. Pommereau, F. Fournel, L. Sanchez, C. Dupré, V. Muffato, J. Decobert
Proceedings Volume 11880, 118800I (2021) https://doi.org/10.1117/12.2602126
KEYWORDS: Semiconducting wafers, Silicon, Wafer bonding, Coarse wavelength division multiplexing, Photonic integrated circuits

Proceedings Article | 1 February 2019 Presentation + Paper
G. Hamon, N. Vaissiere, C. Lausecker, R. Cariou, W. Chen, J. Alvarez, J. Maurice, G. Patriarche, L. Largeau, J. Decobert, J. Kleider, P. Roca i Cabarrocas
Proceedings Volume 10926, 109261C (2019) https://doi.org/10.1117/12.2511174
KEYWORDS: Gallium arsenide, Silicon, Plasma enhanced chemical vapor deposition, Plasma, Epitaxy, Doping, Hydrogen, Crystals, Silicon films, X-ray diffraction

Showing 5 of 6 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top