Dr. Nicole Saulnier
at IBM Corp
SPIE Involvement:
Author
Publications (12)

PROCEEDINGS ARTICLE | March 30, 2017
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Lithography, Logic, Optical lithography, Manufacturing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Computational lithography, Optical proximity correction, Nanoimprint lithography, Tolerancing, Stochastic processes, Back end of line, Design for manufacturability

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Semiconductors, Modeling, Metrology, Modulation, 3D modeling, Scanning electron microscopy, Optical metrology, Process control, Photomasks, Extreme ultraviolet, Line width roughness, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Edge roughness

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Semiconductors, Optical imaging, Lithography, Metrology, Modulation, Etching, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Line edge roughness, Photoresist processing, Semiconducting wafers, Edge roughness

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Optical lithography, Etching, Metals, Interfaces, Silicon, Quantum efficiency, Materials processing, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing

SPIE Journal Paper | July 19, 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Optical proximity correction, Data modeling, Critical dimension metrology, Optical calibration, Scanning electron microscopy, Hybrid optics, Metals, Calibration, Instrument modeling, OLE for process control

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Semiconductors, Lithography, Metrology, Roads, Scattering, Etching, Inspection, Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Line edge roughness

Showing 5 of 12 publications
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