Nicolo Morgana
Staff Engineer at Infineon Technologies Dresden
SPIE Involvement:
Author
Publications (19)

PROCEEDINGS ARTICLE | September 19, 2018
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Lithography, Ions, Manufacturing, Doping, Photomasks, Ion implantation, Semiconductor manufacturing, Photoresist processing, Semiconducting wafers, Grayscale lithography

PROCEEDINGS ARTICLE | March 26, 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Oxides, Visualization, Etching, Metals, Silicon, Manufacturing, Computer simulations, Signal processing, Optical alignment, Semiconducting wafers

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Oxides, Lithography, Etching, Ions, Atomic force microscopy, Photoresist materials, Photomasks, Reactive ion etching, Semiconducting wafers, Grayscale lithography

SPIE Journal Paper | January 1, 2009
JM3 Vol. 8 Issue 01
KEYWORDS: Etching, Double patterning technology, Critical dimension metrology, Amorphous silicon, Lithography, Scanning electron microscopy, Photomasks, Image processing, Cadmium, Silicon

PROCEEDINGS ARTICLE | April 1, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Atrial fibrillation, Calibration, Etching, 3D modeling, Printing, Photomasks, Optical proximity correction, Mask making, 193nm lithography

PROCEEDINGS ARTICLE | November 16, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Diffraction, Lithographic illumination, Scattering, 3D modeling, Near field, Photomasks, Optical proximity correction, Semiconducting wafers, Systems modeling, Near field optics

Showing 5 of 19 publications
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