Dr. Nigel R. Farrar
Vice President Technical Marketing at ASML
SPIE Involvement:
Conference Program Committee | Author
Publications (41)

Proceedings Article | 16 March 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Extreme ultraviolet, Light sources, Pulsed laser operation, Extreme ultraviolet lithography, Plasma, Amplifiers, High power lasers, Tin, Laser energy, High volume manufacturing

Proceedings Article | 13 March 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Semiconducting wafers, Pellicles, Extreme ultraviolet, Reticles, Extreme ultraviolet lithography, Imaging systems, Logic, Scanners, Manufacturing, Overlay metrology

Proceedings Article | 17 April 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Plasma, Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Tin, Light sources, Deep ultraviolet, Laser development, Hydrogen, Laser applications

Proceedings Article | 17 April 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Semiconducting wafers, Reticles, Extreme ultraviolet lithography, Extreme ultraviolet, Logic, Imaging systems, Scanners, Optical proximity correction, Metrology, Photomasks

Proceedings Article | 18 March 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Scanners, Control systems, Tin, Reflectivity, Mirrors, Pulsed laser operation, Laser scanners

Showing 5 of 41 publications
Conference Committee Involvement (10)
Optical Microlithography XXVI
26 February 2013 | San Jose, California, United States
Optical Microlithography XXV
14 February 2012 | San Jose, California, United States
Optical Microlithography XXIV
1 March 2011 | San Jose, California, United States
SPIE Lithography Asia - Korea
13 October 2010 | n/a, Republic of Korea
Optical Microlithography XXIII
23 February 2010 | San Jose, California, United States
Showing 5 of 10 Conference Committees
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