Dr. Nigel P. Smith
Fellow at Onto Innovation
SPIE Involvement:
Publications (36)

Proceedings Article | 6 April 2012 Paper
Jie Li, Asher Tan, JinWoo Jung, Gary Goelzer, Nigel Smith, Jiangtao Hu, Boo-Hyun Ham, Min-Cheol Kwak, Cheol-Hong Kim, Suk-Woo Nam
Proceedings Volume 8324, 83243A (2012) https://doi.org/10.1117/12.918706
KEYWORDS: Semiconducting wafers, Overlay metrology, Detection and tracking algorithms, Wafer testing, Wafer-level optics, Reflectivity, Oxides, Error analysis, Silicon, Precision measurement

Proceedings Article | 5 April 2012 Paper
Nigel Smith, Brennan Peterson, Gary Goelzer
Proceedings Volume 8324, 832418 (2012) https://doi.org/10.1117/12.918076
KEYWORDS: Overlay metrology, Semiconducting wafers, Error analysis, Image processing, Process control, Distortion, Photomasks, Diffraction, Metrology, Wafer testing

Proceedings Article | 2 April 2010 Paper
Prasad Dasari, Nigel Smith, Gary Goelzer, Zhuan Liu, Jie Li, Asher Tan, Chin Hwee Koh
Proceedings Volume 7638, 76381P (2010) https://doi.org/10.1117/12.848189
KEYWORDS: Overlay metrology, Semiconducting wafers, Scatterometry, Error analysis, Data modeling, Reflectometry, Process control, Spectroscopy, Diffraction gratings, Carbon

Proceedings Article | 2 April 2010 Paper
Proceedings Volume 7638, 76382C (2010) https://doi.org/10.1117/12.848516
KEYWORDS: Overlay metrology, Double patterning technology, Spectroscopic ellipsometry, Semiconducting wafers, Time metrology, Optical components, Metrology, Diffraction, Integrated circuits, Critical dimension metrology

Proceedings Article | 24 March 2009 Paper
Prasad Dasari, Rahul Korlahalli, Jie Li, Nigel Smith, Oleg Kritsun, Cathy Volkman
Proceedings Volume 7272, 727212 (2009) https://doi.org/10.1117/12.816590
KEYWORDS: Overlay metrology, Double patterning technology, Optical lithography, Data modeling, Metrology, Semiconducting wafers, Scatterometry, Spectroscopy, Lithography, Etching

Showing 5 of 36 publications
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