Dr. Nigel P. Smith
Technical Fellow at Nanometrics Inc
SPIE Involvement:
Author
Publications (36)

Proceedings Article | 6 April 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Semiconducting wafers, Overlay metrology, Detection and tracking algorithms, Wafer testing, Wafer-level optics, Reflectivity, Oxides, Error analysis, Silicon, Precision measurement

Proceedings Article | 5 April 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Overlay metrology, Semiconducting wafers, Error analysis, Image processing, Process control, Distortion, Photomasks, Diffraction, Metrology, Wafer testing

Proceedings Article | 2 April 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Overlay metrology, Semiconducting wafers, Scatterometry, Error analysis, Data modeling, Reflectometry, Process control, Spectroscopy, Diffraction gratings, Carbon

Proceedings Article | 2 April 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Overlay metrology, Double patterning technology, Spectroscopic ellipsometry, Semiconducting wafers, Time metrology, Optical components, Metrology, Diffraction, Integrated circuits, Critical dimension metrology

Proceedings Article | 24 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Overlay metrology, Double patterning technology, Optical lithography, Data modeling, Metrology, Semiconducting wafers, Scatterometry, Spectroscopy, Lithography, Etching

Showing 5 of 36 publications
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