Dr. Nihar Mohanty
at Oculus VR, LLC
SPIE Involvement:
Conference Program Committee | Author
Publications (14)

PROCEEDINGS ARTICLE | May 9, 2017
Proc. SPIE. 10149, Advanced Etch Technology for Nanopatterning VI
KEYWORDS: Oxides, Lithography, Optical lithography, Etching, Silicon, Silicon films, Line width roughness, Plasma etching, Line edge roughness, Semiconducting wafers

PROCEEDINGS ARTICLE | April 27, 2017
Proc. SPIE. 10149, Advanced Etch Technology for Nanopatterning VI
KEYWORDS: Optical lithography, Etching, Chemistry, Line width roughness, Wet etching, Plasma etching, Line edge roughness, Plasma, Back end of line, Front end of line

PROCEEDINGS ARTICLE | April 26, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Lithography, Logic, Optical lithography, Etching, Metals, Control systems, Computer simulations, Photomasks, Extreme ultraviolet, Semiconducting wafers, TCAD, Back end of line, Front end of line

PROCEEDINGS ARTICLE | April 7, 2017
Proc. SPIE. 10149, Advanced Etch Technology for Nanopatterning VI
KEYWORDS: Semiconductors, Lithography, Optical lithography, Etching, Metals, Dielectrics, Photomasks, Plasma etching, Double patterning technology, Immersion lithography, Optical alignment, Tolerancing, System on a chip, Overlay metrology, Plasma, Back end of line

PROCEEDINGS ARTICLE | April 7, 2017
Proc. SPIE. 10149, Advanced Etch Technology for Nanopatterning VI
KEYWORDS: Amorphous silicon, Semiconductors, Lithography, Optical lithography, Silica, Etching, Metals, Coating, Materials processing, Photomasks, Extreme ultraviolet, Double patterning technology, High volume manufacturing, System on a chip, Standards development, Tin

PROCEEDINGS ARTICLE | April 4, 2017
Proc. SPIE. 10149, Advanced Etch Technology for Nanopatterning VI
KEYWORDS: Semiconductors, Oxides, Optical lithography, Spatial frequencies, Etching, Error analysis, Chemistry, Scanning electron microscopy, Atomic layer deposition, Line width roughness, Double patterning technology, Immersion lithography, Line edge roughness, Error control coding, Semiconducting wafers, Plasma

Showing 5 of 14 publications
Conference Committee Involvement (2)
Advanced Etch Technology for Nanopatterning VIII
25 February 2019 | San Jose, California, United States
Advanced Etch Technology for Nanopatterning VII
26 February 2018 | San Jose, California, United States
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