Dr. Nikolay A. Artemiev
Research Scientist at KLA Tencor Corp
SPIE Involvement:
Area of Expertise:
Optical metrology , Synchrotron radiation , Femtosecond X-ray source , X-ray optics , Compton back scattering X-ray source
Profile Summary

Solid background in conventional visible and synchrotron X-ray instrumentation and optics. Creation of complete experimental setups right from scratch.
Extensive experience performing accurate physical measurements.
Large experience with X-ray synchrotron radiation instrumentation and good knowledge hopes and needs of SR scientists and engineers. Have been working at Siberia-I and Siberia-II synchrotron radiation sources in Moscow, at Elettra synchrotron in Trieste, at the ESRF in Grenoble, at BESSY-II in Berlin, and at Synchrotron Soleil in Saclay.
Large experience with ultrafast and ultra intense lasers, pump-probe experiments.
Broad knowledge of optical and X-ray methods of testing mirrors, crystals and crystal surfaces.
Design and development of complete X-ray experimental setups and instrumentation, X-ray sources, optical schemes and diffraction experiments.
Software development for calculation of various physical phenomena, simulation of experiments and experimental data processing. Large experience in calculation of Compton back scattering. Theoretical and practical experience in the field of X-ray crystal and refractive optics. Practical experience in X-ray measurements of crystal structure perfection, orientation, and interferometric control of surface quality.
Comprehensive knowledge of SR and conventional X-ray and optical instrumentation. Practical skill in planning and controlling experiments, collecting and processing data.
Extensive experience with HV and UHV equipment.
Theoretical and practical knowledge of X-ray and laser physics.
Publications (20)

PROCEEDINGS ARTICLE | September 15, 2016
Proc. SPIE. 9963, Advances in X-Ray/EUV Optics and Components XI
KEYWORDS: Diffraction gratings, Diffraction, X-rays, X-ray diffraction, Etching, Extreme ultraviolet lithography, Monochromators, Plasma etching, Wet etching, Direct write lithography

SPIE Journal Paper | October 12, 2015
OE Vol. 54 Issue 10
KEYWORDS: Metrology, X-ray optics, Control systems, Mirrors, Humidity, X-rays, Temperature metrology, Interferometry, Calibration, Particles

PROCEEDINGS ARTICLE | September 1, 2015
Proc. SPIE. 9576, Applied Advanced Optical Metrology Solutions
KEYWORDS: Modulation transfer functions, Binary data, Calibration, Spatial frequencies, Standards development, Optical microscopes, Silicon, Error analysis, Sensors, Optical fabrication

PROCEEDINGS ARTICLE | September 17, 2014
Proc. SPIE. 9206, Advances in Metrology for X-Ray and EUV Optics V
KEYWORDS: Mirrors, Calibration, Laser beam diagnostics, Autocollimators, Metrology, Solids, Optical sensors, Error analysis, X-ray optics, X-rays

PROCEEDINGS ARTICLE | September 17, 2014
Proc. SPIE. 9206, Advances in Metrology for X-Ray and EUV Optics V
KEYWORDS: Calibration, X-ray optics, Mirrors, Metrology, Autocollimators, Optical testing, Optical spheres, Light sources, Spherical lenses, Precision calibration

PROCEEDINGS ARTICLE | September 17, 2014
Proc. SPIE. 9206, Advances in Metrology for X-Ray and EUV Optics V
KEYWORDS: Metrology, X-ray optics, Calibration, Mirrors, Humidity, Temperature metrology, Optical testing, Interferometry, Control systems, Particles

Showing 5 of 20 publications
  • View contact details

Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top