Dr. Nikolay A. Artemiev
Research Scientist at KLA Tencor Corp
SPIE Involvement:
Author
Area of Expertise:
Optical metrology , Synchrotron radiation , Femtosecond X-ray source , X-ray optics , Compton back scattering X-ray source
Websites:
Profile Summary

Solid background in conventional visible and synchrotron X-ray instrumentation and optics. Creation of complete experimental setups right from scratch.
Extensive experience performing accurate physical measurements.
Large experience with X-ray synchrotron radiation instrumentation and good knowledge hopes and needs of SR scientists and engineers. Have been working at Siberia-I and Siberia-II synchrotron radiation sources in Moscow, at Elettra synchrotron in Trieste, at the ESRF in Grenoble, at BESSY-II in Berlin, and at Synchrotron Soleil in Saclay.
Large experience with ultrafast and ultra intense lasers, pump-probe experiments.
Broad knowledge of optical and X-ray methods of testing mirrors, crystals and crystal surfaces.
Design and development of complete X-ray experimental setups and instrumentation, X-ray sources, optical schemes and diffraction experiments.
Software development for calculation of various physical phenomena, simulation of experiments and experimental data processing. Large experience in calculation of Compton back scattering. Theoretical and practical experience in the field of X-ray crystal and refractive optics. Practical experience in X-ray measurements of crystal structure perfection, orientation, and interferometric control of surface quality.
Comprehensive knowledge of SR and conventional X-ray and optical instrumentation. Practical skill in planning and controlling experiments, collecting and processing data.
Extensive experience with HV and UHV equipment.
Theoretical and practical knowledge of X-ray and laser physics.
Publications (20)

PROCEEDINGS ARTICLE | September 15, 2016
Proc. SPIE. 9963, Advances in X-Ray/EUV Optics and Components XI
KEYWORDS: Diffraction, Etching, X-rays, X-ray diffraction, Wet etching, Plasma etching, Extreme ultraviolet lithography, Monochromators, Direct write lithography, Diffraction gratings

SPIE Journal Paper | October 12, 2015
OE Vol. 54 Issue 10
KEYWORDS: Metrology, X-ray optics, Control systems, Mirrors, Humidity, X-rays, Temperature metrology, Interferometry, Calibration, Particles

PROCEEDINGS ARTICLE | September 1, 2015
Proc. SPIE. 9576, Applied Advanced Optical Metrology Solutions
KEYWORDS: Optical microscopes, Spatial frequencies, Sensors, Calibration, Error analysis, Silicon, Optical fabrication, Modulation transfer functions, Binary data, Standards development

PROCEEDINGS ARTICLE | September 17, 2014
Proc. SPIE. 9206, Advances in Metrology for X-Ray and EUV Optics V
KEYWORDS: Mirrors, X-ray optics, Metrology, Optical sensors, Calibration, Error analysis, X-rays, Autocollimators, Solids, Laser beam diagnostics

PROCEEDINGS ARTICLE | September 17, 2014
Proc. SPIE. 9206, Advances in Metrology for X-Ray and EUV Optics V
KEYWORDS: Mirrors, Light sources, X-ray optics, Metrology, Optical spheres, Calibration, Optical testing, Autocollimators, Spherical lenses, Precision calibration

PROCEEDINGS ARTICLE | September 17, 2014
Proc. SPIE. 9206, Advances in Metrology for X-Ray and EUV Optics V
KEYWORDS: Mirrors, X-ray optics, Metrology, Calibration, Particles, Interferometry, Control systems, Optical testing, Humidity, Temperature metrology

Showing 5 of 20 publications
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