Dr. Nina V. Dziomkina
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Reticles, Particles, Silicon, Manufacturing, Pellicles, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Prototyping, Protactinium

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Reticles, Scanners, Ultraviolet radiation, Particles, Manufacturing, Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Neodymium, Semiconducting wafers

PROCEEDINGS ARTICLE | April 5, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Thin films, Polymethylmethacrylate, Satellites, Water, Capillaries, Oxygen, Immersion lithography, Semiconducting wafers, Plasma, Liquids

PROCEEDINGS ARTICLE | August 27, 2005
Proc. SPIE. 5931, Nanoengineering: Fabrication, Properties, Optics, and Devices II
KEYWORDS: Lithography, Optical lithography, Electrodes, Polymers, Particles, Crystals, Dielectrics, Photonic crystals, Scanning electron microscopy, Crystallography

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