CONFERENCE PROCEEDINGS
Advanced Search
Dr. Ninad S. Shinde
at Merck Electronics Ltd
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 1 April 2009 Paper
Image reversal trilayer process using standard positive photoresist
David Abdallah, John Sagan, Kazunori Kurosawa, Jin Li, Yusuke Takano, Yasuo Shimizu, Ninad Shinde, Tatsuro Nagahara, Tomonori Ishikawa, Ralph Dammel
Proceedings Volume 7273, 72732K (2009) https://doi.org/10.1117/12.815149
KEYWORDS: Etching, Image processing, Photoresist materials, Silicon, Photomasks, Oxygen, Semiconducting wafers, Lithography, Carbon, Optical lithography
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top