Mr. Ning Chen
Assisant Development Engineer at Univ of California Berkeley
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | December 30, 2003
Proc. SPIE. 5342, Micromachining and Microfabrication Process Technology IX
KEYWORDS: Etching, Ions, Silicon, Oxygen, Photomasks, Deep reactive ion etching, Reactive ion etching, Fluorine, Semiconducting wafers, Plasma

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top