Ning-ning Jia
at SAMSUNG Electronics Co., Ltd.
SPIE Involvement:
Publications (5)

Proceedings Article | 20 March 2018 Presentation + Paper
Proceedings Volume 10587, 105870G (2018)
KEYWORDS: Photomasks, Source mask optimization, Optical proximity correction, Lithography, SRAF, Semiconducting wafers, Printing, Electroluminescence, Scanning electron microscopy, Pattern recognition

Proceedings Article | 31 March 2014 Paper
Proceedings Volume 9052, 905209 (2014)
KEYWORDS: Wavefronts, Photomasks, Diffraction, Reticles, Zernike polynomials, Binary data, Logic, Logic devices, Lenses, Lithography

Proceedings Article | 12 April 2013 Paper
Proceedings Volume 8683, 86830C (2013)
KEYWORDS: Photomasks, Critical dimension metrology, Source mask optimization, Electron beams, Optical proximity correction, Neodymium, Error analysis, Lithography, Semiconducting wafers, Monte Carlo methods

Proceedings Article | 11 December 2009 Paper
Proceedings Volume 7520, 75200E (2009)
KEYWORDS: Photomasks, Manufacturing, Lithography, Control systems, Binary data, Optical transfer functions, Image segmentation, Optimization (mathematics), Mathematical modeling, Coherence imaging

Proceedings Article | 4 December 2008 Paper
Proceedings Volume 7140, 71401W (2008)
KEYWORDS: Photomasks, Optical proximity correction, Mathematical modeling, Error analysis, Imaging systems, Detection and tracking algorithms, Lithography, Critical dimension metrology, Optimization (mathematics), Model-based design

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