Ning-ning Jia
at SAMSUNG Electronics Co., Ltd.
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Pattern recognition, Electroluminescence, Scanning electron microscopy, Printing, Photomasks, Source mask optimization, Optical proximity correction, SRAF, Semiconducting wafers

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Diffraction, Reticles, Logic, Lenses, Wavefronts, Zernike polynomials, Photomasks, Logic devices, Binary data

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Electron beams, Error analysis, Monte Carlo methods, Photomasks, Source mask optimization, Optical proximity correction, Critical dimension metrology, Neodymium, Semiconducting wafers

PROCEEDINGS ARTICLE | December 11, 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Mathematical modeling, Lithography, Optical transfer functions, Coherence imaging, Image segmentation, Manufacturing, Control systems, Photomasks, Optimization (mathematics), Binary data

PROCEEDINGS ARTICLE | December 4, 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Mathematical modeling, Lithography, Detection and tracking algorithms, Imaging systems, Error analysis, Photomasks, Optical proximity correction, Critical dimension metrology, Optimization (mathematics), Model-based design

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