Tin sulfide (SnS) thin films of different thicknesses were deposited on TCO-coated glass substrates by pulse
electrodeposition. The applied potential pulses were -0.95V (V<sub>on</sub>) and +0.1V (V<sub>off</sub>). Crystal structure of the deposited
films was orthorhombic with lattice parameters similar to that of the mineral herzenbergite. A systematic increase in the
band gap value was observed with increase in the film thickness. The dark conductivities of 60 and 510 nm thick films
were 3.8 x 10<sup>-8</sup> Ω cm<sup>-1</sup> and 6.72 x10<sup>-7</sup> Ω cm<sup>-1</sup> respectively. The structural parameters such as lattice constants and grain
size showed a systematic change with film thickness.