Dr. Nishrin Kachwala
Technology Development
SPIE Involvement:
Author
Publications (12)

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Image processing, Photomasks, Machine learning, Source mask optimization, Computational lithography, Optical proximity correction, SRAF, Model-based design

PROCEEDINGS ARTICLE | October 30, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Particles, Manufacturing, Design for manufacturing, Field effect transistors, Semiconducting wafers, Tolerancing, Yield improvement, Model-based design, Chemical mechanical planarization, Design for manufacturability

PROCEEDINGS ARTICLE | May 5, 2005
Proc. SPIE. 5756, Design and Process Integration for Microelectronic Manufacturing III
KEYWORDS: Manufacturing, Capacitance, Design for manufacturing, Photomasks, Optical proximity correction, SRAF, Computer aided design, Resolution enhancement technologies, Instrument modeling, Design for manufacturability

PROCEEDINGS ARTICLE | December 6, 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Manufacturing, Design for manufacturing, Photomasks, Optical proximity correction, SRAF, Computer aided design, Resolution enhancement technologies, Instrument modeling, Design for manufacturability

PROCEEDINGS ARTICLE | August 16, 2002
Proc. SPIE. 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Lithography, Reticles, Etching, Quartz, Inspection, Bridges, Photomasks, Optical proximity correction, Binary data, Phase shifts

PROCEEDINGS ARTICLE | July 30, 2002
Proc. SPIE. 4691, Optical Microlithography XV
KEYWORDS: Lithography, Diffraction, Optical lithography, Calibration, Scanners, Photomasks

Showing 5 of 12 publications
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