Dr. Nivea G.S. Figueiro
Application Specialist at Nova Measuring Instruments GmbH
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | September 19, 2018
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Wafer-level optics, Lithography, Metrology, Scatterometry, Machine learning, Maskless lithography, Reflectance spectroscopy, Electron beam direct write lithography, Semiconducting wafers, Inverse optics, Channel projecting optics

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Logic, Etching, Gallium arsenide, Silicon, Heart, Transmission electron microscopy, Scatterometry, Nanowires

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Lithography, Electron beam lithography, Metrology, Optical lithography, Nano opto mechanical systems, Error analysis, Inspection, Scatterometry, Optical metrology, Process control, Cadmium sulfide, Extreme ultraviolet lithography, Maskless lithography, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers, Scatter measurement

PROCEEDINGS ARTICLE | May 14, 2012
Proc. SPIE. 8378, Scanning Microscopies 2012: Advanced Microscopy Technologies for Defense, Homeland Security, Forensic, Life, Environmental, and Industrial Sciences
KEYWORDS: Semiconductors, Image fusion, Metrology, Calibration, Manufacturing, Transmission electron microscopy, Scatterometry, 3D metrology, Critical dimension metrology, Data fusion

PROCEEDINGS ARTICLE | April 4, 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Semiconductors, Image fusion, Metrology, Calibration, Transmission electron microscopy, Scatterometry, 3D metrology, Critical dimension metrology, Data fusion, Nanowires

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