Dr. Nivea G. Schuch
Application Engineer / Product Development at ASELTA Nanographics
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 27 March 2020 Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Analytics, Metrology, Optical lithography, Visualization, Image processing, Silicon, Doping, Scanning electron microscopy, Image quality, Process control, Optical proximity correction

Proceedings Article | 19 September 2018 Paper
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Wafer-level optics, Lithography, Metrology, Scatterometry, Machine learning, Maskless lithography, Reflectance spectroscopy, Electron beam direct write lithography, Semiconducting wafers, Inverse optics, Channel projecting optics

Proceedings Article | 19 March 2018 Presentation
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Logic, Etching, Gallium arsenide, Silicon, Heart, Transmission electron microscopy, Scatterometry, Nanowires

Proceedings Article | 28 March 2017 Paper
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Lithography, Electron beam lithography, Metrology, Optical lithography, Nano opto mechanical systems, Error analysis, Inspection, Scatterometry, Optical metrology, Process control, Cadmium sulfide, Extreme ultraviolet lithography, Maskless lithography, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers, Scatter measurement

Proceedings Article | 14 May 2012 Paper
Proc. SPIE. 8378, Scanning Microscopies 2012: Advanced Microscopy Technologies for Defense, Homeland Security, Forensic, Life, Environmental, and Industrial Sciences
KEYWORDS: Semiconductors, Image fusion, Metrology, Calibration, Manufacturing, Transmission electron microscopy, Scatterometry, 3D metrology, Critical dimension metrology, Data fusion

Showing 5 of 6 publications
Conference Committee Involvement (1)
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
21 February 2021 | San Jose, California, United States
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