Noboru Otsuka
at JSR Micro NV
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | March 21, 2012
Proc. SPIE. 8323, Alternative Lithographic Technologies IV
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Silicon, Chemistry, Photoresist materials, Extreme ultraviolet, Line width roughness, Semiconducting wafers, Chemically amplified resists

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