Nobuhiro Komine
at Toshiba Materials Co Ltd
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | April 10, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Semiconductors, Reticles, Optical lithography, Atrial fibrillation, Sensors, Scanning electron microscopy, Photomasks, Semiconducting wafers, Polysomnography, Phase shifts

PROCEEDINGS ARTICLE | April 2, 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Semiconductors, Lithography, Metrology, Statistical analysis, Visualization, Error analysis, Inspection, Optimization (mathematics), Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 23, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Radon, Control systems, Distortion, Process control, Immersion lithography, Source mask optimization, Semiconducting wafers, Data corrections, Overlay metrology, Osmium

PROCEEDINGS ARTICLE | May 28, 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Semiconductors, Diffraction, Monochromatic aberrations, Light sources, Image acquisition, Lens design, Scanning electron microscopy, SRAF, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | April 29, 2004
Proc. SPIE. 5378, Data Analysis and Modeling for Process Control
KEYWORDS: Semiconductors, Data modeling, Databases, Scanners, Error analysis, Control systems, Distortion, Semiconducting wafers, Systems modeling, Overlay metrology

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