Nobuhiro Takahashi
at Tokyo Electron Ltd
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 12 April 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Semiconductors, Lithography, Etching, Dry etching, Particles, Interfaces, Silicon, Process control, Immersion lithography, Photoresist processing

Proceedings Article | 21 March 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Semiconductors, Carbon, Lithography, Ions, Gases, Dielectrophoresis, Adsorption, Semiconductor manufacturing, Ion exchange, 193nm lithography

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Semiconductors, Carbon, Polymers, Manufacturing, Adsorption, Semiconductor manufacturing, Photoresist processing, Semiconducting wafers, Contamination control, 193nm lithography

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