Nobuhito Toyama
Research Engineer at Dai Nippon Printing Co Ltd
SPIE Involvement:
Author
Publications (30)

PROCEEDINGS ARTICLE | September 25, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Oxides, Quartz, Ultraviolet radiation, Silicon, Chromium, Scanning electron microscopy, Chemical analysis, Nanoimprint lithography, Photoresist processing, Chemically amplified resists

PROCEEDINGS ARTICLE | September 30, 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Thin films, Etching, Quartz, Ultraviolet radiation, Silicon, Photomasks, Nanoimprint lithography, Photoresist processing, Beam propagation method, Chemically amplified resists

PROCEEDINGS ARTICLE | September 30, 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Quartz, Image processing, Manufacturing, Inspection, Electronic components, Photomasks, Beam shaping, Nanoimprint lithography, Vestigial sideband modulation, Defect inspection

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Lithography, Diffraction, Polarization, 3D modeling, 3D printing, Printing, 3D metrology, Photomasks, Critical dimension metrology, Binary data

PROCEEDINGS ARTICLE | May 2, 2008
Proc. SPIE. 6792, 24th European Mask and Lithography Conference
KEYWORDS: Lithography, Optical lithography, Gaussian beams, Etching, Line width roughness, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Vestigial sideband modulation, Chemically amplified resists

PROCEEDINGS ARTICLE | May 2, 2008
Proc. SPIE. 6792, 24th European Mask and Lithography Conference
KEYWORDS: Lithography, Diffraction, 3D modeling, Image analysis, Scanning electron microscopy, 3D printing, Printing, 3D metrology, Photomasks, Critical dimension metrology

Showing 5 of 30 publications
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