Nobuo Ando
at Sumitomo Chemical Co Ltd
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | March 26, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Polymers, Molecules, Ions, Photoresist materials, Extreme ultraviolet, Chemical analysis, Extreme ultraviolet lithography, Line edge roughness, Chemically amplified resists

PROCEEDINGS ARTICLE | April 3, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Thin films, Lithography, Polymers, X-rays, Interfaces, Surface properties, Chemical analysis, Photoemission spectroscopy, Fluorine, Polymer thin films

PROCEEDINGS ARTICLE | April 11, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Polymers, Scanners, Molecules, Diffusion, Photoresist materials, Line width roughness, Immersion lithography, Semiconducting wafers, Photoresist developing

PROCEEDINGS ARTICLE | February 19, 2003
Proc. SPIE. 4830, Third International Symposium on Laser Precision Microfabrication
KEYWORDS: Lithium, Electrodes, Ions, Silicon, Doping, Raman spectroscopy, Laser ablation, Excimer lasers, Heterojunctions, Organic semiconductors

PROCEEDINGS ARTICLE | July 24, 2002
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Lithium, Dry etching, Diffusion, Manufacturing, Resistance, Head, Transmittance, Semiconducting wafers, Atmospheric modeling, Picture Archiving and Communication System

PROCEEDINGS ARTICLE | June 18, 2002
Proc. SPIE. 4637, Photon Processing in Microelectronics and Photonics
KEYWORDS: Carbon, Lithium, Chemical species, Electrodes, Particles, Ions, Doping, Raman spectroscopy, Laser ablation, Excimer lasers

Showing 5 of 8 publications
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