Mr. Nobuo Miyamoto
at NuFlare Technology Inc
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | October 25, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Logic, Optical lithography, LCDs, Photomasks, Extreme ultraviolet, Electron beam melting, Line edge roughness

PROCEEDINGS ARTICLE | September 9, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Semiconductors, Electron beams, Electrodes, Manufacturing, Power supplies, Photomasks, Photomask technology, Temperature metrology, Protactinium, Current controlled current source

PROCEEDINGS ARTICLE | May 11, 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Monochromatic aberrations, Electron beams, Manufacturing, Control systems, Photomasks, Beam shaping, Electron beam melting, Line edge roughness, Photoresist processing, Standards development

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