Nobutaka Magome
Sr. V.P. at Nikon Research Corp of America
SPIE Involvement:
Author
Publications (19)

SPIE Journal Paper | 5 August 2014
OE Vol. 53 Issue 08
KEYWORDS: Moire patterns, Metrology, Semiconducting wafers, Photoresist materials, Distance measurement, Photomasks, Sensors, Wafer-level optics, Image registration, Error analysis

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Reticles, Logic, Optical lithography, Etching, Distortion, Double patterning technology, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Reticles, Etching, Image processing, Photomasks, Line width roughness, Double patterning technology, Photoresist processing, Semiconducting wafers, Overlay metrology

SPIE Journal Paper | 1 January 2009
JM3 Vol. 8 Issue 01
KEYWORDS: Double patterning technology, Photomasks, Etching, Reticles, Lithography, Optical lithography, Semiconducting wafers, Image processing, Photoresist processing, Deposition processes

Proceedings Article | 4 December 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Reticles, Logic, Interferometers, Etching, Distortion, Photomasks, Double patterning technology, Photoresist processing, Semiconducting wafers

Proceedings Article | 7 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Imaging systems, Sensors, Calibration, Scanners, Manufacturing, Control systems, Lens design, Immersion lithography, Critical dimension metrology, Semiconducting wafers

Showing 5 of 19 publications
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