Nobuyasu Horiuchi
President at Nippon Control System Corp
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | May 20, 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Energy efficiency, Detection and tracking algorithms, Data modeling, Modulation, Scattering, Computing systems, Parallel processing, Control systems, Computer simulations, Electron beam direct write lithography

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Mirrors, Data compression, Scattering, Control systems, Computer aided design, Data conversion, Data centers, Electron beam direct write lithography, Data corrections, Solid modeling

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Mirrors, Data compression, Inspection, Distortion, Data processing, Photomasks, Computer aided design, Data conversion, Electron beam direct write lithography, Charged-particle lithography

PROCEEDINGS ARTICLE | May 6, 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Mirrors, Inspection, Distortion, Photomasks, Local area networks, Computer aided design, Data conversion, Electron beam direct write lithography, Data corrections, Charged-particle lithography

PROCEEDINGS ARTICLE | August 20, 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Semiconductors, Data compression, Inspection, Distortion, Photomasks, Optical alignment, Computer aided design, Data conversion, Data corrections, Charged-particle lithography

PROCEEDINGS ARTICLE | August 20, 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Semiconductors, Logic, Data compression, Inspection, Control systems, Photomasks, Computer aided design, Data conversion, Semiconducting wafers, Data corrections

Showing 5 of 10 publications
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