Nobuyasu Horiuchi
President at Nippon Control System Corp
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 20 May 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Energy efficiency, Detection and tracking algorithms, Data modeling, Modulation, Scattering, Computing systems, Parallel processing, Control systems, Computer simulations, Electron beam direct write lithography

Proceedings Article | 24 March 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Mirrors, Data compression, Scattering, Control systems, Computer aided design, Data conversion, Data centers, Electron beam direct write lithography, Data corrections, Solid modeling

Proceedings Article | 28 June 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Mirrors, Data compression, Inspection, Distortion, Data processing, Photomasks, Computer aided design, Data conversion, Electron beam direct write lithography, Charged-particle lithography

Proceedings Article | 6 May 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Mirrors, Inspection, Distortion, Photomasks, Local area networks, Computer aided design, Data conversion, Electron beam direct write lithography, Data corrections, Charged-particle lithography

Proceedings Article | 20 August 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Semiconductors, Data compression, Inspection, Distortion, Photomasks, Optical alignment, Computer aided design, Data conversion, Data corrections, Charged-particle lithography

Showing 5 of 10 publications
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