Dr. Nobuyuki N. Matsuzawa Profile

Dr. Nobuyuki N. Matsuzawa

Principal Engineer & Director at Panasonic Industry Co., Ltd.

SPIE Involvement:

Conference Program Committee | Author

Proceedings Article | 29 March 2006 Paper

Optimization of dual BARC structures for hyper-NA immersion lithography

Hiroichi Kawahira, Yuko Yamaguchi, Hiroyuki Nakano, Nobuyuki Matsuzawa, Ken Ozawa, Boontarika Thunnakart

Proceedings Volume 6153, 61531J (2006) https://doi.org/10.1117/12.651563

KEYWORDS: Silicon, Reflectivity, Oxides, Refractive index, Immersion lithography, Photoresist materials, Lithography, Optimization (mathematics), Polarization, Semiconductors

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Proceedings Article | 29 March 2006 Paper

Changes of chemical nature of photoresists induced by various plasma treatments and their impact on LWR

Eriko Matsui, Nobuyuki Matsuzawa, Hiroichi Kawahira, Kazi M. A. Salam, Takeshi Iwai, Hiroyuki Nakano, Yuko Yamaguchi, Katsuhisa Kugimiya, Tetsuya Tatsumi, Makiko Irie, Atsuhiro Ando, Masashi Yoshida

Proceedings Volume 6153, 615319 (2006) https://doi.org/10.1117/12.656002

KEYWORDS: Line width roughness, Photoresist materials, Etching, Plasma, Plasma treatment, Chemical analysis, FT-IR spectroscopy, Polymers, Lithography, Semiconducting wafers

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Proceedings Article | 24 August 2001 Paper

Theoretical calculations of photoabsorption of several alicyclic molecules in the vacuum ultraviolet region

Akihiko Ishitani, David Dixon, Tsuyoshi Uda, Nobuyuki Matsuzawa

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436871

KEYWORDS: Absorbance, Molecules, Polymers, Lithography, Vacuum ultraviolet, Fluorine, Absorption, Photoresist materials, Polymethylmethacrylate, Oscillators

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Proceedings Article | 24 August 2001 Paper

Control of line edge roughness of ultrathin resist films subjected to EUV exposure

Ei Yano, Hiroaki Oizumi, Nobuyuki Matsuzawa, Manhyoung Ryoo, Shigeo Irie, Shigeru Shirayone, Shinji Okazaki

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436814

KEYWORDS: Line edge roughness, Extreme ultraviolet lithography, Thin films, Lithography, Extreme ultraviolet, Atomic force microscopy, Scanning electron microscopy, Critical dimension metrology, Atomic force microscope, Image processing

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Proceedings Article | 20 August 2001 Paper

Theoretical calculations of photoabsorption of polymers in the EUV (extreme ultraviolet) region

Shigeo Irie, Shinji Okazaki, Akihiko Ishitani, Ei Yano, Nobuyuki Matsuzawa

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436657

KEYWORDS: Polymers, Absorption, Oxygen, Chemical species, Silicon, Transmittance, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Carbon

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Proceedings Article | 23 June 2000 Paper

Theoretical calculations of photoabsorption of molecules in the vacuum ultraviolet region

Shinji Okazaki, David Dixon, Ei Yano, Nobuyuki Matsuzawa, Shigeyasu Mori, Akihiko Ishitani

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388321

KEYWORDS: Lithography, Polymers, Photoresist materials, Absorption, Vacuum ultraviolet, Absorbance, Molecules, Copper indium disulfide, Opacity, Polymethylmethacrylate

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