Dr. Nobuyuki N. Matsuzawa
Senior Principal Scientist at Panasonic Corp
SPIE Involvement:
Conference Program Committee | Author
Publications (12)

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Semiconductors, Oxides, Lithography, Refractive index, Polarization, Silicon, Reflectivity, Photoresist materials, Immersion lithography, Optimization (mathematics)

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, FT-IR spectroscopy, Etching, Polymers, Photoresist materials, Line width roughness, Chemical analysis, Semiconducting wafers, Plasma treatment, Plasma

Proceedings Article | 24 August 2001
Proc. SPIE. 4345, Advances in Resist Technology and Processing XVIII
KEYWORDS: Lithography, Oscillators, Polymethylmethacrylate, Polymers, Molecules, Photoresist materials, Absorbance, Vacuum ultraviolet, Fluorine, Absorption

Proceedings Article | 24 August 2001
Proc. SPIE. 4345, Advances in Resist Technology and Processing XVIII
KEYWORDS: Thin films, Lithography, Image processing, Atomic force microscopy, Scanning electron microscopy, Extreme ultraviolet, Atomic force microscope, Extreme ultraviolet lithography, Critical dimension metrology, Line edge roughness

Proceedings Article | 20 August 2001
Proc. SPIE. 4343, Emerging Lithographic Technologies V
KEYWORDS: Carbon, Chemical species, Polymers, Silicon, Oxygen, Transmittance, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Absorption

Showing 5 of 12 publications
Conference Committee Involvement (14)
Advances in Patterning Materials and Processes XXXVII
24 February 2020 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXVI
25 February 2019 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXV
27 February 2018 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXIV
28 February 2017 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXIII
29 February 2016 | San Jose, California, United States
Showing 5 of 14 Conference Committees
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