Dr. Nobuyuki Yoshioka
Senior Staff at Dai Nippon Printing Co Ltd
SPIE Involvement:
Editor | Author
Publications (48)

Proceedings Article | 11 May 2009 Paper
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Semiconductors, Electronics, Manufacturing, Data processing, Design for manufacturing, Information technology, Photomasks, Semiconducting wafers, Process modeling, Standards development

Proceedings Article | 20 May 2006 Paper
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Semiconductors, Reticles, Manufacturing, Inspection, Design for manufacturing, Photomasks, Optical proximity correction, System on a chip, Standards development, Design for manufacturability

Proceedings Article | 9 November 2005 Paper
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Wafer-level optics, Semiconductors, Genetic algorithms, Computer simulations, Photomasks, Genetics, Optical proximity correction, Optimization (mathematics), Semiconducting wafers, Model-based design

Proceedings Article | 28 June 2005 Paper
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Semiconductors, Lithography, Polarization, Design for manufacturing, Photomasks, Optical proximity correction, Maskless lithography, Semiconducting wafers, System on a chip, Design for manufacturability

Proceedings Article | 6 December 2004 Paper
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Defect detection, Speckle, Sensors, Image processing, Inspection, Optical inspection, Image sensors, Photomasks, Modulation transfer functions, Algorithm development

Showing 5 of 48 publications
Proceedings Volume Editor (3)

Conference Committee Involvement (6)
Photomask Japan 2016
6 April 2016 | Yokohama, Japan
Photomask Japan 2015
20 April 2015 | Yokohama, Japan
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XIII
18 April 2006 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XII
13 April 2005 | Yokohama, Japan
Showing 5 of 6 Conference Committees
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top