Dr. Nobuyuki Yoshioka
Leader of Mask Group at Dai Nippon Printing Co Ltd
SPIE Involvement:
Conference Chair | Conference Co-Chair | Conference Program Committee | Editor | Author
Publications (51)

Proceedings Article | 11 May 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Semiconductors, Electronics, Manufacturing, Data processing, Design for manufacturing, Information technology, Photomasks, Semiconducting wafers, Process modeling, Standards development

Proceedings Article | 20 May 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Semiconductors, Reticles, Manufacturing, Inspection, Design for manufacturing, Photomasks, Optical proximity correction, System on a chip, Standards development, Design for manufacturability

Showing 5 of 51 publications
Conference Committee Involvement (6)
Photomask Japan 2016
6 April 2016 | Yokohama, Japan
Photomask Japan 2015
20 April 2015 | Yokohama, Japan
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XIII
18 April 2006 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XII
13 April 2005 | Yokohama, Japan
Showing 5 of 6 Conference Committees
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