Mr. Norbert B. Koster
Principal Scientist at TNO
SPIE Involvement:
Author
Publications (20)

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Reticles, Lifetime testing equipment, Cameras, Scintillators, Photodiodes, Optical testing, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics

PROCEEDINGS ARTICLE | September 28, 2017
Proc. SPIE. 10446, 33rd European Mask and Lithography Conference
KEYWORDS: Reticles, Optical coherence tomography, Particles, Inspection, Pellicles, Photomasks, Extreme ultraviolet, Optics manufacturing, Contamination control, EUV optics

PROCEEDINGS ARTICLE | July 13, 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Mirrors, Reticles, Metrology, Statistical analysis, Scanners, Scintillators, Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Contamination control, Ruthenium, EUV optics

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Carbon, Contamination, Sensors, Molecules, Ions, Manufacturing, Scanning electron microscopy, Xenon, Process control, Extreme ultraviolet, Semiconductor manufacturing, Krypton, Semiconducting wafers, Vacuum deposition, Yield improvement, Vacuum equipment

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Mirrors, Reticles, Particles, Interfaces, Scintillators, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Contamination control, EUV optics, Plasma, Light

PROCEEDINGS ARTICLE | October 5, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Optical filters, Metrology, Statistical analysis, Calibration, Photodiodes, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics

Showing 5 of 20 publications
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