Dr. Noreen Harned
Vice President Marketing & Technology at ASML
SPIE Involvement:
Publications (26)

Proceedings Article | 16 March 2015 Paper
Proceedings Volume 9422, 94220B (2015) https://doi.org/10.1117/12.2087421
KEYWORDS: Extreme ultraviolet, Light sources, Pulsed laser operation, Extreme ultraviolet lithography, Plasma, Amplifiers, High power lasers, Tin, Laser energy, High volume manufacturing

Proceedings Article | 13 March 2015 Paper
Alberto Pirati, Rudy Peeters, Daniel Smith, Sjoerd Lok, Arthur W. Minnaert, Martijn van Noordenburg, Jörg Mallmann, Noreen Harned, Judon Stoeldraijer, Christian Wagner, Carmen Zoldesi, Eelco van Setten, Jo Finders, Koen de Peuter, Chris de Ruijter, Milos Popadic, Roger Huang, Martin Lin, Frank Chuang, Roderik van Es, Marcel Beckers, David Brandt, Nigel Farrar, Alex Schafgans, Daniel Brown, Herman Boom, Hans Meiling, Ron Kool
Proceedings Volume 9422, 94221P (2015) https://doi.org/10.1117/12.2085912
KEYWORDS: Semiconducting wafers, Pellicles, Extreme ultraviolet, Reticles, Extreme ultraviolet lithography, Imaging systems, Logic, Scanners, Manufacturing, Overlay metrology

Proceedings Article | 17 April 2014 Paper
Proceedings Volume 9048, 904835 (2014) https://doi.org/10.1117/12.2048195
KEYWORDS: Plasma, Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Tin, Light sources, Deep ultraviolet, Laser development, Hydrogen, Laser applications

Proceedings Article | 17 April 2014 Paper
Rudy Peeters, Sjoerd Lok, Joerg Mallman, Martijn van Noordenburg, Noreen Harned, Peter Kuerz, Martin Lowisch, Eelco van Setten, Guido Schiffelers, Alberto Pirati, Judon Stoeldraijer, David Brandt, Nigel Farrar, Igor Fomenkov, Herman Boom, Hans Meiling, Ron Kool
Proceedings Volume 9048, 90481J (2014) https://doi.org/10.1117/12.2046909
KEYWORDS: Semiconducting wafers, Reticles, Extreme ultraviolet lithography, Extreme ultraviolet, Logic, Imaging systems, Scanners, Optical proximity correction, Metrology, Photomasks

Proceedings Article | 18 March 2014 Paper
Proceedings Volume 9048, 90480C (2014) https://doi.org/10.1117/12.2048184
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Scanners, Control systems, Tin, Reflectivity, Mirrors, Pulsed laser operation, Laser scanners

Showing 5 of 26 publications
Proceedings Volume Editor (1)

Conference Committee Involvement (1)
Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications
7 August 2003 | San Diego, California, United States
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