Dr. Noreen Harned
Vice President Marketing & Technology at ASML
SPIE Involvement:
Conference Co-Chair | Author
Publications (27)

PROCEEDINGS ARTICLE | March 16, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Light sources, Laser energy, High power lasers, Amplifiers, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Pulsed laser operation, Plasma, Tin

PROCEEDINGS ARTICLE | March 13, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Reticles, Logic, Imaging systems, Scanners, Manufacturing, Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Reticles, Metrology, Logic, Imaging systems, Scanners, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Semiconducting wafers

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Light sources, Deep ultraviolet, Scanners, Hydrogen, Laser applications, Laser development, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Tin

PROCEEDINGS ARTICLE | March 18, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Mirrors, Scanners, Reflectivity, Control systems, Laser scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Pulsed laser operation, Plasma, Tin

PROCEEDINGS ARTICLE | October 3, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Reticles, Deep ultraviolet, Scanners, Reflectivity, Photomasks, Extreme ultraviolet, Aluminum, Extreme ultraviolet lithography, Optical proximity correction, Semiconducting wafers

Showing 5 of 27 publications
Conference Committee Involvement (1)
Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications
7 August 2003 | San Diego, California, United States
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