Noriaki Fujitani
at Nissan Chemical Corp
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 17 April 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Lithography, Lithographic illumination, Etching, Polymers, Capillaries, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Photoresist processing, Liquids

Proceedings Article | 17 April 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Lithography, Optical lithography, Contamination, Deep ultraviolet, Manufacturing, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Photoresist processing

Proceedings Article | 27 March 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Lithography, Roentgenium, Etching, Silicon, Chromophores, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, System on a chip

Proceedings Article | 29 March 2013
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Lithography, Optical lithography, Contamination, Deep ultraviolet, Chemical species, Transmittance, Extreme ultraviolet, Absorbance, Extreme ultraviolet lithography, Thin film coatings

Proceedings Article | 28 March 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Lithography, Roentgenium, Silica, Etching, Polymers, Coating, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography

Showing 5 of 9 publications
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