Noriaki Nakayamada
Senior Technology Expert at NuFlare Technology Inc
SPIE Involvement:
Publications (46)

Proceedings Article | 9 April 2024 Presentation + Paper
Hiroshi Matsumoto, Jumpei Yasuda, Tomoo Motosugi, Hayato Kimura, Yoshinori Kojima, Hiroshi Yamashita, Masato Saito, Noriaki Nakayamada
Proceedings Volume 12956, 1295602 (2024)
KEYWORDS: Extreme ultraviolet, Aberration correction, Optical lithography, Optical design, Resolution enhancement technologies, Printing, Distortion, Semiconducting wafers, Projection systems

SPIE Journal Paper | 14 February 2024
Noriaki Nakayamada, Haruyuki Nomura, Yasuo Kato, Kenichi Yasui, Abhishek Shendre, Nagesh Shirali, Yukihiro Masuda, Aki Fujimura
JM3, Vol. 23, Issue 01, 011206, (February 2024)
KEYWORDS: Design, Etching, Vestigial sideband modulation, Printing, Dose control, Raster graphics, Bias correction, Lithography, Electron beam lithography, Scanning electron microscopy

Proceedings Article | 21 November 2023 Presentation + Paper
Hiroshi Matsumoto, Jumpei Yasuda, Tomoo Motosugi, Hayato Kimura, Michihiro Kawaguchi, Yoshinori Kojima, Hiroshi Yamashita, Masato Saito, Takao Tamura, Noriaki Nakayamada
Proceedings Volume 12751, 127510X (2023)
KEYWORDS: Extreme ultraviolet, Electron beam lithography, Projection lithography, Resolution enhancement technologies, Distortion, Mask making

Proceedings Article | 1 May 2023 Presentation + Paper
Proceedings Volume 12497, 1249708 (2023)
KEYWORDS: Manufacturing, Extreme ultraviolet, Data conversion, Control systems, Microelectromechanical systems, Photomasks, Electron beam lithography

Proceedings Article | 30 April 2023 Presentation
Noriaki Nakayamada, Haruyuki Nomura, Ryosuke Ueba, Yasuo Kato, Kenichi Yasui
Proceedings Volume 12495, 1249507 (2023)
KEYWORDS: Photomasks, Vestigial sideband modulation, Raster graphics, Manufacturing, Electron beam lithography, Beam shaping

Showing 5 of 46 publications
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