Noriaki Nakayamada
Senior Technology Expert at NuFlare Technology Inc
SPIE Involvement:
Author
Publications (27)

PROCEEDINGS ARTICLE | July 13, 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Convolutional neural networks, Neural networks, Machine learning, Artificial intelligence, Critical dimension metrology, Yield improvement

PROCEEDINGS ARTICLE | July 13, 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Metrology, Backscatter, Time metrology, Thermal effects, Mathematics, Photomasks, Beam shaping, Thermal modeling, Vestigial sideband modulation, Temperature metrology

PROCEEDINGS ARTICLE | July 13, 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Point spread functions, Manufacturing, Photomasks, Extreme ultraviolet, SRAF, Nanoimprint lithography, Line edge roughness, Semiconducting wafers, Vestigial sideband modulation

PROCEEDINGS ARTICLE | October 25, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Logic, Optical lithography, LCDs, Photomasks, Extreme ultraviolet, Electron beam melting, Line edge roughness

SPIE Journal Paper | March 23, 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Critical dimension metrology, Beam shaping, Vestigial sideband modulation, Photomasks, Diffusion, Glasses, Line edge roughness, Error analysis, Thermal modeling, Temperature metrology

PROCEEDINGS ARTICLE | July 9, 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Electron beam lithography, Roentgenium, Modulation, Quartz, Diffusion, Computer simulations, Photomasks, Critical dimension metrology, Thermal modeling, Temperature metrology

Showing 5 of 27 publications
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