Noriaki Oikawa
at Tokyo Electron Miyagi Ltd
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Lithography, Metrology, Optical lithography, Statistical analysis, Etching, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Stochastic processes

Proceedings Article | 21 March 2017
Proc. SPIE. 10144, Emerging Patterning Technologies
KEYWORDS: Lithography, Polymethylmethacrylate, Etching, Image processing, Computer simulations, Scanning electron microscopy, Bridges, Line width roughness, Directed self assembly, Epitaxy, High volume manufacturing, Chemical reactions, Picosecond phenomena, Line edge roughness, Photoresist processing

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top