CONFERENCE PROCEEDINGS
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Norihiko Miyazaki
Project Leader at Fujitsu Ltd
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Author
Publications (5)
Proceedings Article | 11 May 2009 Paper
Organized DFM
Takashi Sato, Michio Honma, Hiroyuki Itoh, Nobuyuki Iriki, Sachiko Kobayashi, Norihiko Miyazaki, Toshio Onodera, Hiroyuki Suzuki, Nobuyuki Yoshioka, Sumika Arima, Kazuya Kadota
Proceedings Volume 7379, 737934 (2009) https://doi.org/10.1117/12.824354
KEYWORDS: Design for manufacturing, Manufacturing, Standards development, Process modeling, Semiconductors, Information technology, Photomasks, Electronics, Semiconducting wafers, Data processing
Proceedings Article | 20 May 2006 Paper
Design for manufacturability production management activity report
Norihiko Miyazaki, T. Sato, M. Honma, N. Yoshioka, K. Hosono, T. Onodera, H. Itoh, H. Suzuki, T. Uga, K. Kadota, N. Iriki
Proceedings Volume 6283, 628302 (2006) https://doi.org/10.1117/12.681729
KEYWORDS: Design for manufacturing, Photomasks, Manufacturing, Design for manufacturability, Reticles, Standards development, Inspection, Optical proximity correction, System on a chip, Semiconductors
Proceedings Article | 20 August 2004 Paper
The guideline of reticle data management
Norihiko Miyazaki, N. Iriki, M. Homma, T. Sato, M. Mori, Tadashi Imoriya, Toshio Onodera, T. Matsuda, Hidehiro Higashino, K. Okuda, Iwao Higashikawa, Nobuyuki Yoshioka
Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557741
KEYWORDS: Photomasks, Reticles, Data modeling, Manufacturing, Semiconducting wafers, Image processing, Standards development, Design for manufacturability, Information technology, System on a chip
Proceedings Article | 2 June 2004 Paper
The guideline of reticle data management (Ver. 2)
Nobuyuki Iriki, Norihiko Miyazaki, M. Homma, T. Sato, Toshio Onodera, T. Matsuda, T. Uga, Hidehiro Higashino, Iwao Higashikawa, Nobuyuki Yoshioka
Proceedings Volume 5504, (2004) https://doi.org/10.1117/12.568028
KEYWORDS: Reticles, Photomasks, Manufacturing, Semiconducting wafers, Design for manufacturability, Standards development, Data modeling, Electronic design automation, System on a chip, Semiconductors
Proceedings Article | 26 June 2003 Paper
Guideline of reticle data management
Norihiko Miyazaki, N. Iriki, M. Homma, T. Sato, M. Mori, Tadashi Imoriya, Toshio Onodera, T. Matsuda, Hidehiro Higashino, K. Okuda, Iwao Higashikawa, Nobuyuki Yoshioka
Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.484438
KEYWORDS: Photomasks, Reticles, Data modeling, Manufacturing, Semiconducting wafers, Image processing, Standards development, Design for manufacturability, Information technology, System on a chip
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