Dr. Norihito Fukugami
at Toppan Printing Co Ltd
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 12 June 2018
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Deep ultraviolet, Reflection, Manufacturing, Reflectivity, Atomic force microscopy, Optical testing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 10 May 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Deep ultraviolet, Reflection, Ultraviolet radiation, Manufacturing, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Neodymium, Semiconducting wafers

Proceedings Article | 18 March 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Deep ultraviolet, Reflection, Imaging systems, Scanners, Manufacturing, Reflectivity, Printing, Photomasks, Extreme ultraviolet, Semiconductor manufacturing, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 9 July 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Reticles, Opacity, Scanners, Reflectivity, Scanning electron microscopy, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 17 October 2014
Proc. SPIE. 9231, 30th European Mask and Lithography Conference
KEYWORDS: Reticles, Deep ultraviolet, Scanners, Reflectivity, Atomic force microscopy, Photomasks, Extreme ultraviolet, Aluminum, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 28 July 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Reticles, Deep ultraviolet, Scanners, Reflectivity, Atomic force microscopy, 3D metrology, Photomasks, Extreme ultraviolet, Neodymium, Semiconducting wafers

Showing 5 of 14 publications
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