CONFERENCE PROCEEDINGS
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Noriko Yamashita
at FUJIFILM Corp
SPIE Involvement:
Author
Publications (2)
PROCEEDINGS ARTICLE | September 25, 2010
Duplicated templates for discrete track media
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Quartz, Ultraviolet radiation, Nickel, Silicon, Photomasks, Line width roughness, Servomechanisms, Nanoimprint lithography, Reactive ion etching, Semiconducting wafers
PROCEEDINGS ARTICLE | September 23, 2009
Duplicated quartz template for 2.5 inch discrete track media
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Lithography, Etching, Quartz, Silicon, Resistance, Scanning electron microscopy, Photomasks, Nanoimprint lithography, Reactive ion etching, Photoresist processing
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