Dr. Norio Kimura
at EBARA Corp Precision Machinery Co
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | September 16, 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Defect detection, Sensors, Particles, Inspection, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Image enhancement, Semiconducting wafers, Defect inspection

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Signal to noise ratio, Defect detection, Particles, Inspection, Image acquisition, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Performance modeling, Systems modeling

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Signal to noise ratio, Sensors, Particles, Inspection, Image acquisition, Electron microscopes, Scanning electron microscopy, Optical inspection, Image quality, Extreme ultraviolet

PROCEEDINGS ARTICLE | September 29, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Defect detection, Particles, Inspection, Electron microscopes, Scanning electron microscopy, Optical inspection, Photomasks, Extreme ultraviolet, Prototyping, Defect inspection

PROCEEDINGS ARTICLE | December 6, 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Roads, Error analysis, Distortion, Photomasks, Optical alignment, Overlay metrology, Phase shifts

PROCEEDINGS ARTICLE | August 20, 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Electron beams, Etching, Image processing, Coating, Chromium, Distortion, Photomasks, Optical alignment, Photoresist processing, Phase shifts

Showing 5 of 8 publications
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