Dr. No-Young Chung
Senior Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | March 28, 2014
Proc. SPIE. 9053, Design-Process-Technology Co-optimization for Manufacturability VIII
KEYWORDS: Lithography, Photovoltaics, Optical lithography, Metals, Manufacturing, Photomasks, Source mask optimization, Optical proximity correction, Optimization (mathematics), Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 15, 2012
Proc. SPIE. 8327, Design for Manufacturability through Design-Process Integration VI
KEYWORDS: Calibration, Etching, Metals, Image processing, Copper, Bridges, Photomasks, SRAF, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Oxides, Data modeling, Calibration, Reflectivity, Photoresist materials, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Model-based design

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Optical lithography, Data modeling, Reflection, Calibration, Silicon, Photoresist materials, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 13, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Optical lithography, Data modeling, Calibration, 3D modeling, Scanning electron microscopy, Photoresist materials, Photomasks, Critical dimension metrology, Statistical modeling, 3D image processing

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Optical lithography, Calibration, Etching, Metals, 3D modeling, Bridges, Design for manufacturing, Optical proximity correction, Optimization (mathematics), Process modeling

Showing 5 of 8 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top