No-Young Chung
Principal Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Publications (12)

Proceedings Article | 10 April 2024 Presentation + Paper
Soojung Kim, No Young Chung, Kwangseok Maeng, Hyunjae Cho, Jerry Lim, Hyungrok Jang, Jae Hyoung Kim, Insung Kim, Eelco van Setten, Hidde Keizers, Ajinkya Patil, Steven Beekmans, Jungtae Lee, Ki-Seok Kim, James Lee, Sung-Woon Park, Jialei Tang, Stephen Hsu, Youping Zhang, Paul Derks
Proceedings Volume 12953, 1295306 (2024)
KEYWORDS: Wavefronts, Extreme ultraviolet, Extreme ultraviolet lithography, Light sources and illumination, Stochastic processes, Diffraction, Optical lithography, Source mask optimization, Projection systems

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12955, 129550N (2024)
KEYWORDS: Metrology, Overlay metrology, Scanning electron microscopy, Semiconducting wafers, Critical dimension metrology, Metals, High volume manufacturing, Contour extraction, Computer aided design, Design

Proceedings Article | 28 April 2023 Presentation + Paper
Proceedings Volume 12495, 1249518 (2023)
KEYWORDS: Data modeling, Process modeling, Machine learning, Optical proximity correction, Statistical modeling, Calibration, Instrument modeling, Metrology, Design and modelling, Resolution enhancement technologies

Proceedings Article | 23 March 2020 Presentation + Paper
Changsoo Kim, Seungjong Lee, Sangwoo Park, No-Young Chung, Jungmin Kim, Narae Bang, Sanghwa Lee, SooRyong Lee, Robert Boone, Pengcheng Li, Jiyoon Chang, Xinxin Zhou, YoungMi Kim, MinSu Oh, Minsung Kim, Rachit Gupta, Jun Ye, Stanislas Baron
Proceedings Volume 11323, 1132317 (2020)
KEYWORDS: Data modeling, Optical proximity correction, Performance modeling, Neural networks, Image processing, Machine learning, Lithography, Extreme ultraviolet, Photoresist processing, Statistical modeling

Proceedings Article | 28 March 2014 Paper
No-Young Chung, Pil-Soo Kang, Na-Rae Bang, Jong-Du Kim, Suk-Ju Lee, Byung-Il Choi, Bong-Ryoul Choi, Sung-Woon Park, Ki-Ho Baik, Stephen Hsu, Rafael Howell, Xiaofeng Liu, Keith Gronlund
Proceedings Volume 9053, 90530H (2014)
KEYWORDS: Photomasks, Source mask optimization, Optical proximity correction, Metals, Manufacturing, Lithography, Photovoltaics, Resolution enhancement technologies, Optimization (mathematics), Optical lithography

Showing 5 of 12 publications
  • View contact details

Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top