Dr. No-Young Chung
Senior Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Lithography, Data modeling, Image processing, Neural networks, Extreme ultraviolet, Machine learning, Optical proximity correction, Photoresist processing, Statistical modeling, Performance modeling

Proceedings Article | 28 March 2014 Paper
Proc. SPIE. 9053, Design-Process-Technology Co-optimization for Manufacturability VIII
KEYWORDS: Lithography, Photovoltaics, Optical lithography, Metals, Manufacturing, Photomasks, Source mask optimization, Optical proximity correction, Optimization (mathematics), Resolution enhancement technologies

Proceedings Article | 15 March 2012 Paper
Proc. SPIE. 8327, Design for Manufacturability through Design-Process Integration VI
KEYWORDS: Calibration, Etching, Metals, Image processing, Copper, Bridges, Photomasks, SRAF, Photoresist processing, Semiconducting wafers

Proceedings Article | 13 March 2012 Paper
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Oxides, Data modeling, Calibration, Reflectivity, Photoresist materials, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Model-based design

Proceedings Article | 13 March 2012 Paper
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Optical lithography, Data modeling, Reflection, Calibration, Silicon, Photoresist materials, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Showing 5 of 9 publications
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