Dr. Oseo Park
Staff Engineer at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (7)

SPIE Journal Paper | February 7, 2017
JM3 Vol. 16 Issue 01
KEYWORDS: Directed self assembly, Resolution enhancement technologies, Lithography, Metals, Optical lithography, Fin field effect transitor, Photomasks, 3D modeling, Computational lithography, Optical proximity correction

PROCEEDINGS ARTICLE | October 17, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Cadmium, Data modeling, Calibration, Diffusion, Optical proximity correction, Critical dimension metrology, Optimization (mathematics), Photoresist processing, Semiconducting wafers, Model-based design

PROCEEDINGS ARTICLE | March 26, 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Lithography, Reticles, Data modeling, Dry etching, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Performance modeling, Phase shifts

PROCEEDINGS ARTICLE | November 8, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Apodization, Calibration, Diffusion, Distortion, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | May 28, 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Refractive index, Optical lithography, Lithographic illumination, Photoresist materials, Refraction, Photomasks, Immersion lithography, Liquids, Phase shifts

PROCEEDINGS ARTICLE | July 30, 2002
Proc. SPIE. 4691, Optical Microlithography XV
KEYWORDS: Lithography, Phase shifting, Detection and tracking algorithms, Visualization, Image processing, Photomasks, Optical proximity correction, Model-based design, Process modeling, Resolution enhancement technologies

Showing 5 of 7 publications
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