Osamu Matsuda
at Hitachi High-Tech Science Corp
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | October 21, 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Etching, Quartz, Ions, Nitrogen, Scanning electron microscopy, Photomasks, Critical dimension metrology, Semiconducting wafers, Phase shifts

PROCEEDINGS ARTICLE | April 7, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Mirrors, Etching, Ions, Silicon, Reflectivity, Image resolution, Ion beams, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium

PROCEEDINGS ARTICLE | May 27, 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Carbon, Tungsten, Silicon, Chemical vapor deposition, Photomasks, Extreme ultraviolet, Chemical analysis, Extreme ultraviolet lithography, Vacuum ultraviolet, Gallium

PROCEEDINGS ARTICLE | October 23, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Opacity, Etching, Scanning electron microscopy, Data processing, Process control, Transmittance, Photomasks, Computer aided design, CAD systems

PROCEEDINGS ARTICLE | May 20, 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Lithography, Sensors, Etching, Quartz, Chromium, Scanning electron microscopy, Transmittance, Photomasks, Critical dimension metrology, Visibility

PROCEEDINGS ARTICLE | November 9, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Opacity, Quartz, Ions, Monte Carlo methods, Transmittance, Photomasks, Gallium, Binary data, 193nm lithography

Showing 5 of 10 publications
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