Dr. Obert R. Wood
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SPIE Involvement:
Fellow status | Conference Program Committee | Conference Chair | Conference Co-Chair | Author | Editor
Publications (95)

SPIE Journal Paper | October 30, 2017
JM3 Vol. 16 Issue 04

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Temporal coherence, Particles, Nickel, Pellicles, Transmittance, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Nanoimprint lithography

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Lithography, Microscopes, Optical lithography, Image segmentation, Reflectivity, Image analysis, 3D metrology, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

SPIE Journal Paper | June 19, 2017
JM3 Vol. 16 Issue 02
KEYWORDS: Systems modeling, Data modeling, Lithography, Tolerancing, Binary data, Photomasks, Image transmission, Semiconductors, Reticles

PROCEEDINGS ARTICLE | March 31, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Electron beams, Light sources, Imaging systems, Scanners, Electrons, Manufacturing, Laser applications, Amplifiers, Optical resonators, Extreme ultraviolet, Extreme ultraviolet lithography, Monochromators, Semiconducting wafers, Free electron lasers, Plasma

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Reflectors, Statistical analysis, Data modeling, Silicon, Reflectivity, Surface roughness, Monte Carlo methods, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Molybdenum, Electromagnetic theory, Scanning tunneling microscopy

Showing 5 of 95 publications
Conference Committee Involvement (9)
Extreme Ultraviolet (EUV) Lithography IX
26 February 2018 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VIII
27 February 2017 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VII
22 February 2016 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VI
23 February 2015 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography V
24 February 2014 | San Jose, California, United States
Showing 5 of 9 published special sections
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