Dr. Obert R. Wood
at GLOBALFOUNDRIES Inc
SPIE Involvement:
Fellow status | Conference Program Committee | Conference Chair | Conference Co-Chair | Author | Editor
Publications (97)

PROCEEDINGS ARTICLE | March 27, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Speckle, Image processing, Scanners, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Stochastic processes

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Lithography, Diffraction, Scanners, Error analysis, Wavefronts, Zernike polynomials, Photomasks, Extreme ultraviolet lithography, Aberration theory, Overlay metrology

SPIE Journal Paper | October 30, 2017
JM3 Vol. 16 Issue 04
KEYWORDS: Free electron lasers, Extreme ultraviolet lithography, Electron beams, Extreme ultraviolet, Electrons, Lithography, Monochromators, Light sources, Scanners, Optical resonators

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Temporal coherence, Particles, Nickel, Pellicles, Transmittance, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Nanoimprint lithography

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Lithography, Microscopes, Optical lithography, Image segmentation, Reflectivity, Image analysis, 3D metrology, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

SPIE Journal Paper | June 19, 2017
JM3 Vol. 16 Issue 02
KEYWORDS: Systems modeling, Data modeling, Lithography, Tolerancing, Binary data, Photomasks, Image transmission, Semiconductors, Reticles

Showing 5 of 97 publications
Conference Committee Involvement (10)
Extreme Ultraviolet (EUV) Lithography X
24 February 2019 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography IX
26 February 2018 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VIII
27 February 2017 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VII
22 February 2016 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VI
23 February 2015 | San Jose, California, United States
Showing 5 of 10 published special sections
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