Obert Wood is a Principal Member of Technical Staff in the Strategic Lithography Technology Department at GLOBALFOUNDRIES. He was a Member of Technical Staff at Bell Laboratories for 34 years and has extensive experience in extreme-ultraviolet lithography, ultra-high intensity lasers and laser surgery. Obert received his B.S., M.S. and Ph.D. Degrees from the University of California at Berkeley in Electrical Engineering in 1964, 1965 and 1969. He is author or co-author of 304 technical papers and inventor or co-inventor of 36 patents and is a fellow of the Optical Society of America and SPIE, a senior member of IEEE, and a member of the AAAS, the American Physical Society, and the American Vacuum Society.
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A near-term industrialized FEL is expected to utilize one of the following three existing emission architectures: (1) selfamplified spontaneous emission (SASE), (2) regenerative amplification (RAFEL), or (3) self-seeding (SS-FEL). Model accelerator parameters are put forward to evaluate the impact of emission architecture on FEL output. Then, variations in the parameter space are applied to assess the potential impact to lithography operations, thereby establishing component sensitivity. The operating range of various accelerator components is discussed based on current accelerator performance demonstrated at various scientific user facilities. Finally, comparison of the performance between the model accelerator parameters and the variation in parameter space provides a means to evaluate the potential emission architectures. A scorecard is presented to facilitate this evaluation and provide a framework for future FEL design and enablement for EUV lithography applications.
The goal of our work is to calculate the variation in mask reflectivity due to various sources of inaccuracies using Monte Carlo simulations. Such calculation is necessary as small changes in the thickness and optical properties of the high-Z and low-Z materials can cause substantial variations in reflectivity. This is further complicated by undesirable intermixing between the two materials used to create the reflector.5 One of the key contributors to mask reflectivity fluctuation is identified to be the intermixing layer thickness. We also investigate the impacts on OPC when the wrong mask information is provided, and evaluate the deterioration of overlapping process window. For a hypothetical N7 via layer, the lack of accurate mask information costs 25% of the depth of focus at 5% exposure latitude. Our work would allow the determination of major contributors to mask reflectivity variation, drive experimental efforts of measuring such contributors, provide strategies to optimize mask reflectivity, and quantize the OPC errors due to imperfect mask modeling.
Initial experience establishing an EUV baseline lithography process for manufacturability assessment
Soft x-ray (14 nm) lithography with ultrathin imaging layers and selective electroless metallization
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