Dr. Obert R. Wood II
SPIE Involvement:
Conference Program Committee | Author | Editor
Area of Expertise:
extreme-ultraviolet lithography , ultra-high intensity lasers , laser surgery
Profile Summary

Obert Wood is a Principal Member of Technical Staff in the Strategic Lithography Technology Department at GLOBALFOUNDRIES. He was a Member of Technical Staff at Bell Laboratories for 34 years and has extensive experience in extreme-ultraviolet lithography, ultra-high intensity lasers and laser surgery. Obert received his B.S., M.S. and Ph.D. Degrees from the University of California at Berkeley in Electrical Engineering in 1964, 1965 and 1969. He is author or co-author of 304 technical papers and inventor or co-inventor of 36 patents and is a fellow of the Optical Society of America and SPIE, a senior member of IEEE, and a member of the AAAS, the American Physical Society, and the American Vacuum Society.
Publications (94)

Proceedings Article | 9 October 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Lithography, Monochromatic aberrations, Metrology, Principal component analysis, Detection and tracking algorithms, Imaging systems, Wavefronts, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 27 March 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Speckle, Image processing, Scanners, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Stochastic processes

Proceedings Article | 19 March 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Lithography, Diffraction, Scanners, Error analysis, Wavefronts, Zernike polynomials, Photomasks, Extreme ultraviolet lithography, Aberration theory, Overlay metrology

SPIE Journal Paper | 30 October 2017
JM3 Vol. 16 Issue 04
KEYWORDS: Free electron lasers, Extreme ultraviolet lithography, Electron beams, Extreme ultraviolet, Electrons, Lithography, Monochromators, Light sources, Scanners, Optical resonators

Proceedings Article | 16 October 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Lithography, Microscopes, Optical lithography, Image segmentation, Reflectivity, Image analysis, 3D metrology, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

Showing 5 of 94 publications
Proceedings Volume Editor (4)

SPIE Conference Volume | 23 April 2015

SPIE Conference Volume | 25 April 2014

SPIE Conference Volume | 26 April 2013

SPIE Conference Volume | 26 April 2012

Conference Committee Involvement (12)
Extreme Ultraviolet (EUV) Lithography XII
21 February 2021 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography XI
24 February 2020 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography X
25 February 2019 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography IX
26 February 2018 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VIII
27 February 2017 | San Jose, California, United States
Showing 5 of 12 Conference Committees
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top